The Effect of pH Solution on Electrodeposit-N-Cu2O Thin Film

Fariza Mohamad, Nabiah Zinal, Lau Kae Lih, Nik Hisyamudin Muhd Nor, Masanobu Izaki

Abstract


n-type semiconducting Cu2O thin film was successfully prepared on FTO coated glass substrate using electrodeposition method. The effect of pH solution was studied in order to optimize the deposition parameters of n-Cu2O. The solution was prepared using copper acetate and acid lactic. The pH solution was accurately adjusted using potassium hydroxide and varied from 3.5 until 6.5. The n-Cu2O was successfully deposited at higher pH solution from 5.5 until 6.5. Moreover, it showed excellent structural characteristic and good morphology properties. The Cu2O was adsorbed light at approximately 600 nm corresponding to the bandgap of 2.0 eV. The successful fabrication of n-Cu2O was confirmed and the significant effect of pH solution was observed.

Keywords


Electrodeposition; n-Cu2O; pH Solution;

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References


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